Memory characteristics of atomic-layer-deposited high- �e HfAlO nanocrystal capacitors

Journal

Electrochemical and Solid-State Letters

Journal Volume

11

Journal Issue

4

Date Issued

2008

Author(s)

Maikap, S.

Tzeng, P.-J.

Wang, T.-Y.

Lin, C.H.

Lee, L.S.

Yang, J.-R.

Tsai, M.-J.

DOI

10.1149/1.2839762

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491622

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-39349093151&doi=10.1149%2f1.2839762&partnerID=40&md5=a089c4124dbe8f3faab7415b9923adcc

SDGs

[SDGs]SDG7

Type

journal article