https://scholars.lib.ntu.edu.tw/handle/123456789/491634| Title: | HfO<inf>2</inf>/HfAlO/HfO<inf>2</inf> nanolaminate charge trapping layers for high-performance nonvolatile memory device applications | Authors: | Maikap, S. Tzeng, P.-J. Wang, T.-Y. Lee, H.-Y. Lin, C.-H. Wang, C.-C. Lee, L.-S. Yang, J.-R. Tsai, M.-J. JER-REN YANG |
Issue Date: | 2007 | Journal Volume: | 46 | Journal Issue: | 4 A | Start page/Pages: | 1803-1807 | Source: | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491634 | DOI: | 10.1143/JJAP.46.1803 |
| Appears in Collections: | 材料科學與工程學系 |
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