HfO2/HfAlO/HfO2 nanolaminate charge trapping layers for high-performance nonvolatile memory device applications
Journal
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Journal Volume
46
Journal Issue
4 A
Pages
1803-1807
Date Issued
2007
Author(s)
Maikap, S.
Tzeng, P.-J.
Wang, T.-Y.
Lee, H.-Y.
Lin, C.-H.
Wang, C.-C.
Lee, L.-S.
Yang, J.-R.
Tsai, M.-J.
Type
journal article