Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition

Journal

Nanotechnology

Journal Volume

26

Journal Issue

1

Date Issued

2015

Author(s)

Shih, H.-Y.

Lin, M.-C.

Chen, L.-Y.

Chen, M.-J.

DOI

10.1088/0957-4484/26/1/014002

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491749

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84916908636&doi=10.1088%2f0957-4484%2f26%2f1%2f014002&partnerID=40&md5=a362965ccd60dee4202c7b0a89014ee1

Type

journal article