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College of Engineering / 工學院
Materials Science and Engineering / 材料科學與工程學系
Accelerating the oxidation rate of AlN substrate through the addition of water vapor
Details
Accelerating the oxidation rate of AlN substrate through the addition of water vapor
Journal
Journal of Asian Ceramic Societies
Journal Volume
5
Journal Issue
4
Pages
381-384
Date Issued
2017
Author(s)
Yeh, C.-T.
Tuan, W.-H.
WEI-HSING TUAN
DOI
10.1016/j.jascer.2017.08.001
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/492142
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-85028458415&doi=10.1016%2fj.jascer.2017.08.001&partnerID=40&md5=efc650611a8d88f3fcbf29d14904abb9
Type
journal article