Study on 193nm immersion interference lithography
Journal
Progress in Biomedical Optics and Imaging - Proceedings of SPIE
Journal Volume
5720
Pages
94-108
Date Issued
2005
Author(s)
Abstract
We report bubble scattering effects on photoresist when a 193nm immersion interferometric lithographic system is employed. According to Mie theory and FDTD simulation, the scattering effect of a bubble becomes significant and may cause defects on a resist pattern when its diameter is greater than 60nm. Some preliminary experimental results are also included.
Type
conference paper