Comparison of Cl2and F-based dry etching for high aspect ratio Si microstructures etched with an inductively coupled plasma source
Journal
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Journal Volume
18
Journal Issue
4
Pages
1890-1896
Date Issued
2000
Author(s)
Tian, W.-C.
Weigold, J.W.
Pang, S.W.
WEI-CHENG TIAN
Type
journal article