https://scholars.lib.ntu.edu.tw/handle/123456789/497739| Title: | Comparison of Cl<inf>2</inf>and F-based dry etching for high aspect ratio Si microstructures etched with an inductively coupled plasma source | Authors: | Tian, W.-C. Weigold, J.W. Pang, S.W. WEI-CHENG TIAN |
Issue Date: | 2000 | Journal Volume: | 18 | Journal Issue: | 4 | Start page/Pages: | 1890-1896 | Source: | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/497739 |
| Appears in Collections: | 電機工程學系 |
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