Oxidation of silicon nitride prepared by plasma-enhanced chemical vapor deposition at low temperature

Journal

Applied Physics Letters

Journal Volume

65

Journal Issue

17

Pages

2229-2231

Date Issued

1994

Author(s)

Liao, W.-S.

Lin, C.-H.

DOI

10.1063/1.112772

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/498749

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-29844457849&doi=10.1063%2f1.112772&partnerID=40&md5=1a6f89ba3b8e338e3d7bc5f74e537c58

SDGs

[SDGs]SDG6

Type

journal article