Nanoprojection lithography using self-assembled interference modules for manufacturing plasmonic gratings
Journal
IEEE Photonics Technology Letters
Journal Volume
24
Journal Issue
15
Pages
1273-1275
Date Issued
2012
Author(s)
Abstract
A new nanoprojection lithography (NPL) is proposed to manufacture plasmonic nanogratings. Here, low-cost self-assembly elastomeric polydimethylsiloxane wavy structures are used as the interference modules, with their periods and amplitudes largely controlled by the applied mechanical strain in the synthesis process. Well-defined plasmonic grating couplers with desired feature sizes and wavelengths of operation were obtained. This NPL may enable large-area and flash manufacturing of plasmonic nanogratings with tunable array periods.
Type
journal article