Skip to main content
English
中文
Log In
Log in
Log in with ORCID
NTU Single Sign On
Have you forgotten your password?
Home
College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Highly directional InAs nanowires grown on Si(111) by selective-area molecular-beam epitaxy
Details
Highly directional InAs nanowires grown on Si(111) by selective-area molecular-beam epitaxy
Journal
2016 5th International Symposium on Next-Generation Electronics, ISNE 2016
Date Issued
2016
Author(s)
Yang, C.-W.
Chen, W.-C.
HAO-HSIUNG LIN
DOI
10.1109/ISNE.2016.7543314
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/500453
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84985930314&doi=10.1109%2fISNE.2016.7543314&partnerID=40&md5=380513f2c3c91b784bc13e10fd929848
Type
conference paper