Abbe-PCA-SMO: Microlithography source and mask optimization based on Abbe-PCA

Journal

Proceedings of SPIE - The International Society for Optical Engineering

Journal Volume

7640

Date Issued

2010

Author(s)

Chang, J.H.-C.

Chen, C.C.-P.

Melvin, L.S.

CHUNG-PING CHEN

DOI

10.1117/12.846615

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/501080

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-79959230545&doi=10.1117%2f12.846615&partnerID=40&md5=ed50f3c649f5d67b7cf329812a014f6f

SDGs

[SDGs]SDG9

Type

conference paper