Hierarchical kernel generation for SMO application
Journal
Proceedings of SPIE - The International Society for Optical Engineering
Journal Volume
7973
Date Issued
2011
Author(s)
Abstract
Resolution enhancement technologies (RETs) are so far widely proposed in improving the quality of micro-lithography process. Latest method such as source mask optimization (SMO) is gaining popularity recently. Therefore, high speed simulator is in strong demand for growing computational complexity of RETs. In this work, we demonstrate that our Abbe-PCA method is highly efficient for source configuring and mask tuning using hierarchical pixel-based OPC. © 2011 SPIE.
SDGs
Type
conference paper