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Research Center / 研究中心
University-Level Research Centers / 校級研究中心
Center for Condensed Matter Sciences / 凝態科學研究中心
Characterization of Interstitial Oxygen in 200 μm Thick Silicon Wafer by Micro-FTIR System
Details
Characterization of Interstitial Oxygen in 200 μm Thick Silicon Wafer by Micro-FTIR System
Journal
Annual Meeting of the Physical Society of R.O.C.
Date Issued
2017
Author(s)
K.-T. Wu
Y.-H. Chang
Y.-M. Chang
URI
http://www.ntu-ccms.ntu.edu.tw/lab/ultrafast/index.htm
https://scholars.lib.ntu.edu.tw/handle/123456789/501578
Description
Taipei, Taiwan,?Jan. 16-18, 2017
Type
poster
