Novel fabrication method for high-aspect-ratio suspended parylene structures.
Journal
6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, February 20-23, 2011
Pages
585-588
Date Issued
2011
Author(s)
Kuo, Wen-Cheng
Abstract
This paper is to present a novel and easy fabrication method for suspended high-aspect-ratio parylene structures on a standard silicon wafer. The process employs the concept of creating parylene beams by multiple parylene deposition/removing steps in the trench, releases the structures at the same side of the silicon wafer, and then fabricates soft beams for the requirement of high sensitivity and low stiffness in in-plane motion. By using the proposed process, a test device of free-standing parylene beams with 20 �gm in width, 3000�gm in span, and 50�gm in thickness is fabricated to verify the feasibility of the suspended parylene-based structure design.
Type
conference paper