https://scholars.lib.ntu.edu.tw/handle/123456789/506118
標題: | The study of compensative structure assisted convex and concave corner structures etching by inductively coupled plasma-reactive ion etch (ICP-RIE). | 作者: | CHIH-CHUNG YANG Lin, Yu-Hsin Cheng, Yuan-Chieh Chu, Nien-Nan Hsu, Wensyang Tang, Yu-Hsiang Chen, Po-Li Yang, Chih-Chung Hsiao, Ming-Hua Hsiao, Chien-Nan CHIH-CHUNG YANG |
公開日期: | 2015 | 起(迄)頁: | 491-493 | 來源出版物: | 10th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2015, Xi'an, China, April 7-11, 2015 | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/506118 | DOI: | 10.1109/NEMS.2015.7147475 |
顯示於: | 電機工程學系 |
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