https://scholars.lib.ntu.edu.tw/handle/123456789/559025| Title: | Improved Low-Voltage Sensing Performance in MIS(p) Tunnel Diodes by Oxide Thickening at the Gate Fringe | Authors: | Lin, K.-W. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2020 | Journal Volume: | 67 | Journal Issue: | 4 | Start page/Pages: | 1845-1851 | Source: | IEEE Transactions on Electron Devices | URI: | https://www.scopus.com/inward/record.url?eid=2-s2.0-85082866254&partnerID=40&md5=0b420ee3c494cefd919054f500500409 https://scholars.lib.ntu.edu.tw/handle/123456789/559025 |
DOI: | 10.1109/TED.2020.2974963 |
| Appears in Collections: | 電機工程學系 |
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