https://scholars.lib.ntu.edu.tw/handle/123456789/573734
標題: | 2D Material Enabled Offset-Patterning with Atomic Resolution | 作者: | Chen S.-H., Hofmann M., Yen Z.-L., Hsieh Y.-P. Mario Hofmann |
關鍵字: | Aspect ratio; Atoms; Graphene; Graphene nanoribbon; Lithography; Nanoribbons; Bilayer graphene nanoribbons; Bottom-up and top-down; Design flexibility; High-resolution patterning; Macroscopic length; Sequential lithography; Stabilization effects; Thickness variation; Substrates | 公開日期: | 2020 | 卷: | 30 | 期: | 40 | 來源出版物: | Advanced Functional Materials | 摘要: | Atomic-precision patterning at large scale is a central requirement for nanotechnology and future electronics that is hindered by the limitations of lithographical techniques. Historically, imperfections of the fabrication tools have been compensated by multi-patterning using sequential lithography processes. The realization of nanometer-scale features from much larger patterns through offset stacking of atomically thin masks is demonstrated. A unique mutual stabilization effect between two graphene layers produces atomically abrupt transitions that selectively expose single-layer covered regions. Bilayer regions, on the other hand, protect the underlying substrate from removal for several hours permitting transfer of atomic thickness variations into lateral features in various semiconductors. Nanoscopic offsets between two 2D materials layers could be introduced through bottom-up and top-down approaches, opening up new routes for high-resolution patterning. A self-aligned templating approach yields nanometer-wide bilayer graphene nanoribbons with macroscopic length that produces high-aspect-ratio silicon nanowalls. Moreover, offset-transfer of lithographically patterned graphene layers enables multipatterning of large arrays of semiconductor features whose resolution is not limited by the employed lithography and could reach <10?nm feature size. The results open up a new route to combining design flexibility with unprecedented resolution at large scale. ? 2020 Wiley-VCH GmbH |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85089143208&doi=10.1002%2fadfm.202004370&partnerID=40&md5=022237b254e73aa032c3cd8e54e6d6db https://scholars.lib.ntu.edu.tw/handle/123456789/573734 |
ISSN: | 1616301X | DOI: | 10.1002/adfm.202004370 |
顯示於: | 物理學系 |
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