https://scholars.lib.ntu.edu.tw/handle/123456789/581009
標題: | 3D integration of vertical-stacking of MoS2and Si CMOS featuring embedded 2T1R configuration demonstrated on full wafers | 作者: | Su, Chunjung Huang, Minkun Lee, K. S. VITA PI-HO HU Huang, Y. F. Zheng, B. C. Yao, C. H. Lin, Neichih Kao, Kuo-Hsing Hsing Hong, Tzu Chieh Sung, Pojung Wu, Chienting Yu, Tungyuan Lin, Kun–Lin Tseng, Y. C. Lin, C. L. Lee, Yaojen Chao, Tiensheng JIUN-YUN LI Wu, Wenfa Shieh, Jiaming Wang, Yeong-Her Yeh, Wenkuan |
關鍵字: | Computation theory; Electron devices; Embedded systems; Layered semiconductors; Molybdenum compounds; RRAM; Silicon wafers; Three dimensional integrated circuits; 3-D integration; CMOS inverters; Compatible process; Computing system; Multiple channels; Performance matching; Resistive switching; Vertical stacking; CMOS integrated circuits | 公開日期: | 2020 | 卷: | 2020-December | 起(迄)頁: | 12.2.1 - 12.2.4 | 來源出版物: | Technical Digest - International Electron Devices Meeting, IEDM | 會議論文: | 66th Annual IEEE International Electron Devices Meeting, IEDM 2020 | 摘要: | For the first time, a 3D stacking of MoS2 and Si CMOS integrated with embedded RRAM is proposed and fabricated, and CMOS inverter comprised of MoS2 nFET and Si pFET is demonstrated. Vertically stacked multiple MoS2 channels are required for the performance matching. Resistive switching (RS) of a Ti/MoS2 /p+-Si structure showing high ON/OFF ratio of 106 is demonstrated firstly by highly Si-compatible process. Surface modification is the key to formation of uniform and smooth stacked MoS2 multiple channels and to enhanced resistive switching endurance. This scheme can be applied to CMOS-based bipolar RRAM 1T1R or 2T1R without increasing the cell size. Our work offers a new pathway with high feasibility of integrated 2D materials and Si FETs into CMOS to enabling 3D embedded logics and memories for future computing systems. ? 2020 IEEE. |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85102942767&doi=10.1109%2fIEDM13553.2020.9371988&partnerID=40&md5=f54869ef946d62235bed986a74065749 https://scholars.lib.ntu.edu.tw/handle/123456789/581009 |
ISSN: | 01631918 | DOI: | 10.1109/IEDM13553.2020.9371988 |
顯示於: | 電機工程學系 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。