https://scholars.lib.ntu.edu.tw/handle/123456789/606998
標題: | Increase in the Efficiency of III-Nitride Micro-LEDs: Atomic-Layer Deposition and Etching | 作者: | Liu, An-Chen Huang, Yu-Ming Singh, Konthoujam James Ahmed, Tanveer Liou, Fang-Jyun Liou, Yu-Hau Ting, Chao-Cheng Li, Yiming Lin, Chien-Chung Samukawa, Seiji Kuo, Hao-Chung CHIH-I WU |
關鍵字: | Atomic layer deposition;Efficiency;Etching;Display technologies;Electronics manufacturers;Etching process;III-Nitride;Microdisplays;Sidewall effects;Light emitting diodes | 公開日期: | 2021 | 卷: | 15 | 期: | 3 | 起(迄)頁: | 18-34 | 來源出版物: | IEEE Nanotechnology Magazine | 摘要: | MICRO-LEDs ( n-LEDs) HAVE been engaged in the next-generation display technology and evolved for various applications from several electronics manufacturers and institutions. The area of n-LEDs (less than 10 # 10 nm2) is desired for the high pixelsper-inch (PPI) value of the microdisplay, but the sidewall effect from the etching process will drop the quantum efficiency ? 2007-2011 IEEE. |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85104190786&doi=10.1109%2fMNANO.2021.3066393&partnerID=40&md5=47c349b8e1fd10a90013eb62938b84a9 https://scholars.lib.ntu.edu.tw/handle/123456789/606998 |
ISSN: | 19324510 | DOI: | 10.1109/MNANO.2021.3066393 |
顯示於: | 電機工程學系 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。