OpenMPL: An Open-Source Layout Decomposer
Journal
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Journal Volume
40
Journal Issue
11
Pages
2331-2344
Date Issued
2021
Author(s)
Abstract
Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step in the design flow, multiple patterning layout decomposition (MPLD) is critical to design closure. Due to the $\mathcal {N} \mathcal {P} $ -hardness of the general decomposition problem, various efficient algorithms have been proposed with high-quality solutions. However, with increasingly complicated design flow and peripheral processing steps, developing a high-quality layout decomposer becomes more and more difficult, slowing down further advancement in this field. This article presents $\mathsf {OpenMPL}$ (2020), an open-source layout decomposition framework, with well-separated peripheral processing and core solving steps. Besides, previous algorithms or techniques are inspected and several issues are discovered. We then propose corresponding new algorithms to resolve these issues. The experiments demonstrate the effectiveness of our proposed algorithms and the efficiency of $\mathsf {OpenMPL}$. ? 1982-2012 IEEE.
Subjects
Design methodology
layout decomposition
VLSI design
Design
Electronics engineering
Advanced technology
Decomposition problems
Design closure
High-quality solutions
Layout decomposition
Multiple patterning
Processing steps
VLSI manufacturing
Integrated circuits
SDGs
Type
journal article