https://scholars.lib.ntu.edu.tw/handle/123456789/611905
Title: | Application of blue laser direct-writing equipment for manufacturing of periodic and aperiodic nanostructure patterns | Authors: | Chen P.-Y. Jywe W.-Y. Wang M.-S. Wu C.-H. Wen-Yuh Jywe |
Keywords: | Controllers;Degrees of freedom (mechanics);Field programmable gate arrays (FPGA);Interferometers;Laser interferometry;Linear motors;Manufacture;Nanostructures;Optical systems;Optical waveguides;Laser direct writing;Laser interferometer;Laser interferometer measurements;Optical diffractions;Periodic nanostructure;Positioning stage;Precision stage;Two-dimensional patterns;Equipment | Issue Date: | 2016 | Journal Volume: | 46 | Start page/Pages: | 263-269 | Source: | Precision Engineering | Abstract: | This study presents the novel development of low cost, highly efficient blue laser direct-writing equipment for using mask-less laser lithography to manufacture periodic and aperiodic nanostructure patterns. The system includes a long-stroke linear motor precision stage (X, Y), a piezoelectric nano-precision stage (Y, θz), a 3-DOF (degrees of freedom) laser interferometer measurement system, and a blue laser direct-writing optical system. The 3-DOF laser interferometer measurement system gives the control system feedback for displacement (X, Y, θz) of the equipment. The laser processing equipment consists of a blue laser direct-writing optical head, a field-programmable gate array (FPGA) alignment interface, and an optical head servo controller. The optical head operates at a wavelength of 405 nm. Processing the nanostructures on thermo-reaction inorganic resists with precise control of the laser intensity, taking advantage of the threshold effect to exceed the limitations of optical diffraction, and reduces the nanostructure hole size. The equipment can be used to fabricate various periodic nanostructure patterns, aperiodic nanostructure patterns, and two-dimensional patterns. The equipment positioning accuracy is within 50 nm at a speed of 50 mm/s, and the minimum critical dimension can be achieved about 100 nm or so. ? 2016 Elsevier Inc. |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84992573941&doi=10.1016%2fj.precisioneng.2016.05.006&partnerID=40&md5=84232d0c1fba4af33194e5eda98d6c0c https://scholars.lib.ntu.edu.tw/handle/123456789/611905 |
DOI: | 10.1016/j.precisioneng.2016.05.006 |
Appears in Collections: | 機械工程學系 |
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