https://scholars.lib.ntu.edu.tw/handle/123456789/632452
標題: | Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004)) | 作者: | Ng P.C.W KUEN-YU TSAI Lee Y.-M Wang F.-M JIA-HAN LI Chen A.C. |
公開日期: | 2011 | 卷: | 10 | 期: | 2 | 來源出版物: | Journal of Micro/Nanolithography, MEMS, and MOEMS | URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-80455141611&doi=10.1117%2f1.3576188&partnerID=40&md5=547fb5697c575b9b5b2f0382fc59840c https://scholars.lib.ntu.edu.tw/handle/123456789/632452 |
ISSN: | 19325150 | DOI: | 10.1117/1.3576188 |
顯示於: | 電機工程學系 |
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