https://scholars.lib.ntu.edu.tw/handle/123456789/641813
標題: | Vapor-Phase Synthesis of Poly(para-xylylene): From Coatings to Porous and Hierarchical Materials | 作者: | Hu, Shu Man Lee, Chin-Yun Ramli, Theresia Cecylia Christy, Jane Chang, Yu-Ming Lee, Kyung Jin Chou, Fang Yu Chiang, Yu-Chih HSIEN-YEH CHEN |
關鍵字: | functional coating | interface | poly(para-xylylene) | structural material | vapor deposition polymerization | 公開日期: | 1-一月-2024 | 來源出版物: | Advanced Functional Materials | 摘要: | Poly(para-xylylene) (PPX) is a robust and biocompatible coating material that is widely used in various applications, including electronics, aerospace and defense materials, automotive materials, and biomaterials. In this progress report, recent developments in PPX technology ranging from the advancement of physical chemistry properties and structural properties for device integration to the transformation of 3D monolith materials of PPX with controls in outer and inner structures at the micro- and nanometer scales are highlighted. Based on emerging chemistry studies on [2.2]paracyclophanes, which are primarily used precursors to synthesize PPX via vapor deposition polymerization, functionalization, and the creation of a wide variety of functional PPX derivatives are demonstrated without resistance. Widely used as an interface coating material, PPX is processed to form integrated structural materials and has already been found to be useful in the market as part of electronic and medical implant products. Using a newly innovated transformation to fabricate PPX through templates (metal-organic frameworks, liquid crystal, ice crystal), 3D monoliths, nanoscale particles, hierarchical and gradient interior structures, and dynamically transformable shapes at the nanoscale are demonstrated. A vast landscape of novel applications and device products is expected based on the already established R&D and market maturity of PPX. |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/641813 | ISSN: | 1616301X | DOI: | 10.1002/adfm.202313511 |
顯示於: | 化學工程學系 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。