Nanometer-thick molecular beam epitaxy Al films capped with in situ deposited Al2O3—High-crystallinity, morphology, and superconductivity
Journal
Journal of Applied Physics
Journal Volume
136
Journal Issue
7
ISSN
0021-8979
1089-7550
Date Issued
2024-08-15
Author(s)
Y. H. G. Lin
C.K. CHENG
L. B. Young
L. S. Chiang
W. S. Chen
K. H. Lai
S. P. Chiu
C. T. Wu
J. J. Lin
C. H. Hsu
Y. H. Lin
J. Kwo
Abstract
Achieving high material perfection in aluminum (Al) films and their associated Al/AlOx heterostructures is essential for enhancing the coherence time in superconducting quantum circuits. We grew Al films with thicknesses ranging from 3 to 30 nanometers (nm) epitaxially on sapphire substrates using molecular beam epitaxy (MBE). An integral aspect of our work involved electron-beam (e-beam) evaporation to directly deposit aluminum oxide (Al2O3) films on the freshly grown ultrathin epitaxial Al films in an ultra-high-vacuum (UHV) environment. This in situ oxide deposition is critical for preventing the oxidation of parts of the Al films, avoiding the formation of undesired native oxides, and thereby preserving the nm-thick Al films in their pristine conditions. The thicknesses of our Al films in the study were accurately determined; for example, coherence lengths of 3.0 and 20.2 nm were measured in the nominal 3.0 and 20 nm thick Al films, respectively. These Al films were epitaxially grown on sapphire substrates, showing an orientational relationship, denoted as Al ( 111 ) ⟨ 2 1 ¯ 1 ¯ ⟩ ∥ sapphire ( 0001 ) [ 2 1 ¯ 1 ¯ 0 ] . The Al/sapphire interface was atomically ordered without any interfacial layers, as confirmed by in situ reflection high-energy electron diffraction (RHEED) and cross-sectional scanning transmission electron microscopy (STEM). All sample surfaces exhibited smoothness with a roughness in the range of 0.1-0.2 nm. The Al films are superconducting with critical temperatures ranging from 1.23 to around 2 K, depending on the film thickness.
Publisher
AIP Publishing
Type
journal article