Attainment of low subthreshold slope in planar inversion-channel InGaAs MOSFET with in situ deposited Al2O3/Y2O3as a gate dielectric
Journal
Japanese Journal of Applied Physics
Journal Volume
61
Journal Issue
SC
Start Page
SC1018
ISSN
0021-4922
1347-4065
Date Issued
2022-02-10
Author(s)
Abstract
We have demonstrated a record low 85 mV dec-1 subthreshold slope (SS) at 300 K among the planar inversion-channel InGaAs metal-oxide-semiconductor field-effect transistors (MOSFETs). Our MOSFETs using in situ deposited Al2O3/Y2O3 as a gate dielectric were fabricated with a self-aligned inversion-channel gate-first process. The temperature-dependent transfer characteristics showed a linear reduction of SS versus temperature, with the attainment of an SS of 22 mV dec-1 at 77 K; the value is comparable to that of the state-of-the-art InGaAs FinFET. The slope factor of SS with temperature (m) is 1.33, which is lower than those reported in the planar InGaAs MOSFETs.
Subjects
cryogenic temperature
high-k dielectrics
III-V
InGaAs metal-oxide-semiconductor field-effect-transistor (MOSFET)
subthreshold slope
Publisher
IOP Publishing
Type
journal article