Precise CD Measurement of Micro Grating Iinewidth Using Multi-view AFM Stitching Method
Other Title
運用多視角原子力顯微鏡影像縫合技術於精密微線寬關鍵尺寸量測
Journal
Journal of the Chinese Society of Mechanical Engineers
Journal Volume
44
Journal Issue
1
Start Page
23
End Page
35
ISSN
0257-9731
Date Issued
2023-02
Author(s)
Abstract
This article presents a new critical dimension (CD) measuring method for nanoscale linewidth measurement of micro gratings employing an image stitching algorithm with AFM (atomic force microscope) multi-view scans. Due to the geometric constraints of AFM scanning, it has been considered a challenging and erroneous task to measure and reconstruct a micro grating using AFM since the AFM measuring tip in the scanning process cannot keep its measuring orientation well against both right-angle side walls of a grating simultaneously. To resolve this, a new strategy of using multi-view scanning with an image stitching algorithm for precise data fusion is presented. Some measurement experiments were conducted to verify the feasibility of the development. As confirmed by measured data, the measurement bias in measuring micro grating using AFM can be controlled at less than 1.0 nanometer for a grating with a linewidth of 820.1nm.
本文提出一種嶄新的關鍵尺寸測量方法，採用原子力顯微鏡之多視圖掃描的影像疊合算法，來準確重建與量測微光柵的線寬。方法中運用嶄新之多視圖掃描和影像疊合演算法進行精確數據之融合，以精確重建標準光柵之線寬。由SEM以及TEM之實測數據證實，對於線寬為820.1 nm的光柵，AFM測量微光柵的測量偏差（bias）可以控制在1.0 nm以下。
Subjects
critical dimension (CD)
image registration
linewidth measurement
atomic force microscopy (AFM)
image stitching
Type
journal article