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  4. A Millimeter Wave Omnidirectional Scattering Surface Using Randomly Placed Metal Patches
 
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A Millimeter Wave Omnidirectional Scattering Surface Using Randomly Placed Metal Patches

Journal
Asia-Pacific Microwave Conference Proceedings, APMC
Start Page
1
End Page
3
ISSN
26903946
ISBN (of the container)
979-833153455-4
Date Issued
2026-02-18
Author(s)
Wang, Fu-Ching
Luo, Jhao-Fu
Lu, Hsin-Chia  
DOI
10.1109/apmc65046.2025.11378778
URI
https://www.scopus.com/record/display.uri?eid=2-s2.0-105033890296&origin=resultslist
https://scholars.lib.ntu.edu.tw/handle/123456789/739750
Abstract
This paper proposes an omnidirectional scattering surface using randomly placed metal patches of the same size. The phase delay from each patch is randomized, thus creating a more omnidirectional scattered field. It can improve the signal coverage without the need to sense user direction, control phases of scattering elements, and more importantly, the DC power. The measured and simulation results of a planar scattering surface using Roger RO4003C substrate show the increased scattered field in the non-radial directions. The measured scattered field is not reduced and is larger than that of a metal plate of the same size for scattering angles larger than +/- 10 degrees.
Event(s)
2025 Asia-Pacific Microwave Conference, APMC 2025
Subjects
metal patches
millimeter wave
RIS
scattering surface
Publisher
IEEE
Type
conference paper

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