https://scholars.lib.ntu.edu.tw/handle/123456789/82060
標題: | 晶圓廠總體設備效能提昇與管理系統(2/2)─子計畫三:半導體設備監看與預防保養 Semiconductor Equipment Monitor ing and Preventive Maintenance |
作者: | 陳正剛 | 關鍵字: | 機台監看;預防保養;Equipment Monitoring;Preventive Maintenance | 公開日期: | 2000 | 出版社: | 臺北市:國立臺灣大學工業工程學研究所 | 摘要: | 當我們正準備進入300mm 半導體製造的世紀,晶圓 在經過每一個製程步驟後的附加價值也急遽的增加。一般 常使用的製程後(post-process) 工程資料量測與分析 (EDA) 或晶圓終端驗收測試 (WAT) 已不敷提高設備良 率的迫切需求,為了更緊密的監視晶圓製造過程並提早發 出設備偏差的警訊,及時設備監看成為極關鍵的技術,一 個準確且有效率的設備監看工具亦是提昇機台設備可使 用率的關鍵並進而增加設備的全面使用效能。第二年計畫 的目的是提出一配合機台監看技術的動態預防保養 (PM) 排程計畫。由於設備監看是及時的且其系統的健康狀況一 直不間斷地被估測,我們可建構一不斷更新的設備可靠度 模型,以此準確的可靠度預測模型為基礎,我們將提出一 更及時的主動式預防保養規劃。這一有效率的 PM 規劃 可大幅減少不必要的預防保養次數以增加其可使用時 間,亦可及時提供機台保養以防止製程差錯的發生並減少 停機時間,這些功能都將有助於總體設備效能 (OEE) 的 大幅提昇。 In semiconductor fabrication processes, the value added on each wafer in every process step is increasing drastically as we enter the era of 300mm wafer processing. Wafer Acceptance Test (WAT) and post-process engineering data measurement and analyses are no longer sufficient to fulfill the urgent need of achieving a higher equipment yield. Realtime monitoring of equipment conditions becomes critical to keep a closer watch on wafer processing and to give early warning on possible equipment excursions. Accurate, effective equipment monitoring is also essential to ensure a high availability and thus a high overall equipment effectiveness. The objective for the second year of this project is to propose a dynamic PM scheduling plan. Since the equipment monitoring is in real time and the system’s health is constantly evaluated, an equipment reliability model with constant updates can be constructed. Based on the accurate prediction of the equipment reliability, the PM schedule can be planned more dynamically and proactively. An effective PM scheduling plan is, thus, developed to maximize the equipment’s availability by eliminating unnecessary maintenance and to minimize the equipment’s down time by providing needed maintenance before failures occur. This will, in turn, greatly enhance the Overall Equipment Effectiveness (OEE). |
URI: | http://ntur.lib.ntu.edu.tw//handle/246246/4180 | 其他識別: | 892212E002041 | Rights: | 國立臺灣大學工業工程學研究所 |
顯示於: | 工業工程學研究所 |
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892212E002041.pdf | 131.25 kB | Adobe PDF | 檢視/開啟 |
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