公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
1999 | Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography | HSUEN-LI CHEN ; LON A. WANG | Applied Optics | 13 | 12 | |
1999 | Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography | Chen, Hsuen-Li ; Wang, Lon A. | Applied Optics | 13 | 12 | |
2003 | High efficiency purification method for multi-walled carbon nanotubes | Ko, C.-J.; Lee, C.-Y.; Ko, F.-H.; Chen, H.L.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2004 | High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes | Chen, H.L.; Cheng, H.C.; Ko, T.S.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2002 | Highly effective chemical route for the preparation of uniform nanometer gold particles by microwave irradiation | Liu, F.-K.; Ker, C.-J.; Ko, F.-H.; Chen, H.-L.; Dai, B.-T.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | | | |
2004 | Highly efficient microwave-assisted purification of multiwalled carbon nanotubes | Ko, C.-J.; Lee, C.-Y.; Ko, F.-H.; Chen, H.-L.; Chu, T.-C.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2014 | Highly reflective liquid mirrors: Exploring the effects of localized surface plasmon resonance and the arrangement of nanoparticles on metal liquid-like films | Yen, Y.-T.; Lu, T.-Y.; Lee, Y.-C.; Yu, C.-C.; Tsai, Y.-C.; Tseng, Y.-C.; Chen, H.-L.; HSUEN-LI CHEN | ACS Applied Materials and Interfaces | | | |
2015 | Incident angle-tuned, broadband, ultrahigh-sensitivity plasmonic antennas prepared from nanoparticles on imprinted mirrors | Yu, C.-C.; Tseng, Y.-C.; Su, P.-Y.; Lin, K.-T.; Shao, C.-C.; Chou, S.-Y.; Yen, Y.-T.; Chen, H.-L.; HSUEN-LI CHEN | Nanoscale | | | |
2007 | Influence of the mask magnification on imaging in hyper-NA lithography | Lin, Chun-Hung; Chen, Hsuen-Li ; Ko, Fu-Hsiang | Journal of the Optical Society of America A-Optics Image Science and | | | |
2013 | Interactions between fluorescence of atomically layered graphene oxide and metallic nanoparticles | Wang Y.; Li S.-S.; Yeh Y.-C.; Yu C.-C.; HSUEN-LI CHEN ; Li F.-C.; YU-MING CHANG ; CHUN-WEI CHEN | Nanoscale | 8 | 7 | |
1999 | Interference Coatings Based on Synthesized Silicon Nitride | Lee, Cheng-Chung; Chen, Hsuen-Li ; Hsu, Jin-Cherng; Tien, Chuen-Lin | Applied Optics | | | |
2010 | Iridescence of Patterned Carbon Nanotube Forests on Flexible Substrates: From Darkest Materials to Colorful Films | Hsieh, Kun-Che; Tsai, Tsung-Yen; Wan, Dehui; Chen, Hsuen-Li ; Tai, Nyan-Hwa | ACS Nano | 37 | 35 | |
2013 | Laser-induced jets of nanoparticles: Exploiting air drag forces to select the particle size of nanoparticle arrays | Tseng, S.-C.; Yu, C.-C.; Lin, D.-C.; Tseng, Y.-C.; HSUEN-LI CHEN ; Chen, Y.-C.; Chou, S.-Y.; LON A. WANG | Nanoscale | 4 | 4 | |
2017 | Loading effect�Vinduced broadband perfect absorber based on single-layer structured metal film | Lin, K.-T.; Chen, H.-L.; Lai, Y.-S.; Yu, C.-C.; Lee, Y.-C.; Su, P.-Y.; Yen, Y.-T.; Chen, B.-Y.; HSUEN-LI CHEN | Nano Energy | | | |
2002 | Low alkaline contamination bilayer bottom antireflective coatings in F<inf>2</inf> excimer laser lithography | Chen, H.L.; Chuang, Y.F.; Lee, C.C.; Ko, F.H.; Hsieh, C.I.; Huang, T.Y.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |
2003 | Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications | Chen, H.L.; Chuang, Y.F.; Lee, C.C.; Hsieh, C.I.; Ko, F.H.; LON A. WANG ; HSUEN-LI CHEN | Microelectronic Engineering | 0 | 0 | |
2001 | Low dielectric constant FLARE 2.0 films as bottom antireflective coating layers for ArF lithography | Chen, H.L.; Cheng, H.C.; Li, M.Y.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2002 | Low dielectric constant polymer materials as bottom antireflective coating layers for both KrF and ArF lithography | HSUEN-LI CHEN ; Cheng H.-C; Ko F.-H; Chu T.-C; Huang T.-Y. | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1 | 1 | |
2001 | Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithography | Chen, H.L.; Ko, F.H.; Chu, T.C.; Cheng, H.C.; Huang, T.Y.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | | | |
2013 | Low pressure radio-frequency oxygen plasma induced oxidation of titanium - Surface characteristics and biological effects | WAN-YU TSENG ; Hsu, S.-H.; Huang, C.-H.; Tu, Y.-C.; Tseng, S.-C.; HSUEN-LI CHEN ; MIN-HUEY CHEN ; Su, W.-F.; LI-DEH LIN | PLoS ONE | 8 | 8 | |