公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2001 | Reduction of substrate alkaline contamination by utilizing multi-layer bottom antireflective coating structures in ArF lithography | Chen, H.L.; Shih, M.C.; Hsieh, C.F.; Chen, B.C.; Ko, F.H.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | | | |
2001 | Studies of chemically amplified deep UV resists for electron beam lithography applications | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Yang, J.Y.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2001 | Thermal flow and chemical shrink techniques for sub-100 nm contact hole fabrication in electron beam lithography | Chen, H.L.; Ko, F.H.; Li, L.S.; Hsu, C.K.; Chen, B.C.; Chu, T.C.; Huang, T.Y.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | | | |
2002 | Thermal-flow techniques for sub-35 nm contact-hole fabrication in electron-beam lithography | Chen, H.L.; Chen, C.H.; Ko, F.H.; Chu, T.C.; Pan, C.T.; Lin, H.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |