公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2002 | Multilayer bottom antireflective coatings for high numerical aperture and modified illumination exposure systems | Chen, H.L.; Fan, W.; Wang, T.J.; Ko, F.H.; Hsieh, C.I.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | | | |
2002 | Novel bilayer bottom antireflective coating structure for high-performance ArF lithography applications | Chen, H.L.; Chao, W.C.; Ko, F.H.; Chu, T.C.; Huang, T.Y.; HSUEN-LI CHEN | Journal of Microlithography, Microfabrication and Microsystems | | | |
2004 | Optical properties of two-dimensional photonic-bandgap crystals characterized by spectral ellipsometry | Hsieh, C.I.; Chen, H.L.; Chao, W.C.; Ko, F.H.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2003 | Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications | Chen, H.L.; Fan, W.; Wang, T.J.; Ko, F.H.; Zhai, R.S.; Hsu, C.K.; Chuang, T.J.; HSUEN-LI CHEN | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | | | |
2003 | Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists | Kuo, C.I.; Chen, H.L.; Chu, Y.H.; Liu, F.K.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2003 | Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithography | Chen, H.L.; Tu, C.W.; Wang, T.J.; Liu, P.T.; Ko, F.H.; Chung, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2005 | Rapidly selective growth of nanoparticles by electron-beam and optical lithographies with chemically amplified resists | Chen, H.L.; Chu, Y.H.; Kuo, C.I.; Liu, F.K.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |
2001 | Reduction of substrate alkaline contamination by utilizing multi-layer bottom antireflective coating structures in ArF lithography | Chen, H.L.; Shih, M.C.; Hsieh, C.F.; Chen, B.C.; Ko, F.H.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | | | |
2001 | Studies of chemically amplified deep UV resists for electron beam lithography applications | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Yang, J.Y.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2001 | Thermal flow and chemical shrink techniques for sub-100 nm contact hole fabrication in electron beam lithography | Chen, H.L.; Ko, F.H.; Li, L.S.; Hsu, C.K.; Chen, B.C.; Chu, T.C.; Huang, T.Y.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | | | |
2002 | Thermal-flow techniques for sub-35 nm contact-hole fabrication in electron-beam lithography | Chen, H.L.; Chen, C.H.; Ko, F.H.; Chu, T.C.; Pan, C.T.; Lin, H.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |