Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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1999 | Thermal stability of Si/Si1 – x – yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition | Liu, C. W.; Tseng, Y. D.; Chern, M. Y.; Chang, C. L.; Sturm, J. C.; LiuCW | Journal of Applied Physics |