公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2008 | Active modulation of surface plasmon resonance wavelengths by applying an electric field to gold nanoparticle-embedded ferroelectric films | Hsieh, K.C.; Chen, H.L.; Wan, D.H.; Shieh, J.; HSUEN-LI CHEN | Journal of Physical Chemistry C | | | |
2003 | Characterization of three-dimensional GaAs/Al/sub x/O/sub y/ near-infrared photonic crystals fabricated by using an auto-cloning technique | Mao, M.H.; Yeh, D.M.; Liu, P.W.; Lin, H.H.; Chen, H.L.; Pan, C.T. | Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE | 0 | 0 | |
2003 | Characterized optical constants of thin films for vacuum ultraviolet lithography applications | Fan, W.; Chen, H.L.; Wu, C.L.; Chang, L.K.S.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2002 | Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography | Chen, H.L.; Chao, W.C.; Ko, F.H.; Chu, T.C.; Cheng, H.C.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | | | |
2006 | Directly patterning ferroelectric films by nanoimprint lithography with low temperature and low pressure | Hsieh, K.C.; Chen, H.L.; Lin, C.H.; Lee, C.Y.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2006 | Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure | Chen, H.L.; Chuang, S.Y.; Cheng, H.C.; Lin, C.H.; Chu, T.C. | Microelectronic Engineering | | | |
2006 | Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure | Chen, H.L.; Chuang, S.Y.; Cheng, H.C.; Lin, C.H.; Chu, T.C.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2003 | Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatings | Cheng, H.C.; Chen, H.L.; Ko, T.S.; Lai, L.J.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2010 | Exploiting optical properties of P3HT:PCBM films for organic solar cells with semitransparent anode | Lee, W.H.; Chuang, S.Y.; Chen, H.L.; Su, W.F.; WEI-FANG SU ; HSUEN-LI CHEN | Thin Solid Films | 68 | 66 | |
2009 | Extraordinary transmittance in three-dimensional crater, pyramid, and hole-array structures prepared through reversal imprinting of metal films | Chen, H.L.; Chuang, S.Y.; Lee, W.H.; Kuo, S.S.; Su, W.F.; Ku, S.L.; WEI-FANG SU ; HSUEN-LI CHEN | Optics Express | 17 | 16 | |
2004 | Fabrication of autocloned photonic crystals by using high-density-plasma chemical vapor deposition | Chen, H.L.; Lee, H.F.; Chao, W.C.; Hsieh, C.I.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2007 | Fabrication of gold-nanoparticle-infiltrated inverse opal structures with both photonic bandgap and surface plasmon resonance characteristics | Chen, H.L.; Lin, Y.H.; Chuang, S.Y.; Wan, D.H.; Lin, C.H.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC | | | |
2007 | Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography | Chen, H.L.; Huang, K.T.; Lin, C.H.; Wang, W.Y.; Fan, W.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2007 | Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography | Chen, H.L.; Huang, K.T.; Lin, C.H.; Wang, W.Y.; Fan, Wonder | Microelectronic Engineering | | | |
2006 | Fabrication of texturing antireflection structures in solar cells by using the defocusing exposure in optical lithography | Chen, H.L.; Fan, W.; Cheng, C.C.; Lin, C.H.; Huang, K.T.; HSUEN-LI CHEN | Journal of the Electrochemical Society | | | |
2001 | A Fabry-Perot type anti-reflective coating for deep ultraviolet binary photomask application | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F <inf>2</inf> excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | | | |
2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F<inf>2</inf>excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |
2003 | High efficiency purification method for multi-walled carbon nanotubes | Ko, C.-J.; Lee, C.-Y.; Ko, F.-H.; Chen, H.L.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2004 | High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes | Chen, H.L.; Cheng, H.C.; Ko, T.S.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |