第 1 到 2 筆結果,共 2 筆。
公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 | |
---|---|---|---|---|---|---|---|
1 | 2014 | Overlay-Aware detailed routing for self-Aligned double patterning lithography using the cut process | Liu, I.-J.; Fang, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG | Design Automation Conference | 25 | 0 | |
2 | 2014 | A novel layout decomposition algorithm for triple patterning lithography | Fang, S.-Y.; Chang, Y.-W.; Chen, W.-Y.; YAO-WEN CHANG | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 46 | 43 |