Results 1-2 of 2 (Search time: 0.005 seconds).
Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link | |
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1 | 2014 | Overlay-Aware detailed routing for self-Aligned double patterning lithography using the cut process | Liu, I.-J.; Fang, S.-Y.; YAO-WEN CHANG | Design Automation Conference | |||
2 | 2014 | A novel layout decomposition algorithm for triple patterning lithography | Fang, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 43 |