https://scholars.lib.ntu.edu.tw/handle/123456789/293623
Title: | Oxide roughness enhanced reliability of MOS tunneling diodes | Authors: | CHEE-WEE LIU Lin, C.-H. Lee, M.H. Hsu, B.-C. Chen, K.-F. Shie, C.-R. CHEE-WEE LIU |
Issue Date: | 2001 | Start page/Pages: | 46-49 | Source: | 2001 International Semiconductor Device Research Symposium, ISDRS 2001 | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-84961817129&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/293623 |
DOI: | 10.1109/ISDRS.2001.984435 |
Appears in Collections: | 電機工程學系 |
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00984435.pdf | 264.11 kB | Adobe PDF | View/Open |
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