https://scholars.lib.ntu.edu.tw/handle/123456789/316573
Title: | The characteristic of HfO2 on strained SiGe | Authors: | CHEE-WEE LIU Chen, T.C. Lee, L.S. Lai, W.Z. CHEE-WEE LIU |
Issue Date: | 2005 | Journal Volume: | 8 | Journal Issue: | 1-3 SPEC. ISS. | Start page/Pages: | 209-213 | Source: | Materials Science in Semiconductor Processing | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-13244255685&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/316573 |
DOI: | 10.1016/j.mssp.2004.09.041 |
Appears in Collections: | 電機工程學系 |
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