https://scholars.lib.ntu.edu.tw/handle/123456789/381410
標題: | Image based in situ electron-beam drift detection by silicon photodiodes in scanning-electron microscopy and an electron-beam lithography system | 作者: | Y. H. Kuo C. J. Wu F. T. Kuo YUNG-YAW CHEN JIA-YUSH YEN |
關鍵字: | Back scattered electron; Electron detectors; Electron-beam drift; Electron-beam lithography | 公開日期: | 三月-2013 | 卷: | 103 | 起(迄)頁: | 137-143 | 來源出版物: | Microelectronic Engineering | 摘要: | A silicon-photodiode detector can be used to sense the position of the electron beam in a scanning-electron microscope. In order to validate the implementation of a electron beam drift detector, a silicon photodiode was constructed with a low profile and small working distance. The performance in detecting the drift of the electron beam over time was analyzed. It was also shown that a back scattered-electron image can be created with electron scanning, which allows the development of highly sensitive in situ beam position feedback in the electron-beam direct-write lithography system. © 2012 Elsevier B.V. All rights reserved. |
URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/381410 https://www.scopus.com/inward/record.uri?eid=2-s2.0-84870168701&doi=10.1016%2fj.mee.2012.08.012&partnerID=40&md5=9c80c8a5920f076a40b1050d1971ca7a |
ISSN: | 01679317 | DOI: | 10.1016/j.mee.2012.08.012 | SDG/關鍵字: | Electron beam lithography; Electron beams; Electron scattering; Lithography; Photodiodes; Scanning electron microscopy; Silicon; Back scattered electron image; Backscattered electrons; Beam positions; Electron beam direct write lithographies; Electron detectors; Image-based; Silicon photodiode; Working distances; Electrons |
顯示於: | 電機工程學系 |
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