https://scholars.lib.ntu.edu.tw/handle/123456789/396596
Title: | Fast lithographic mask optimization considering process variation | Authors: | Su, Y.-H. Huang, Y.-C. Tsai, L.-C. Chang, Y.-W. Banerjee, S. YAO-WEN CHANG |
Issue Date: | 2016 | Journal Volume: | 35 | Journal Issue: | 8 | Start page/Pages: | 1345-1357 | Source: | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-84979609928&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/396596 |
DOI: | 10.1109/TCAD.2015.2514082 |
Appears in Collections: | 電子工程學研究所 |
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