https://scholars.lib.ntu.edu.tw/handle/123456789/491409
Title: | Characteristics of plasma enhanced chemical vapor deposition-grown SiN[sub x] films prepared for deep ultraviolet attenuated phase-shifting masks | Authors: | Chen, H. L. L. A. Wang LON A. WANG HSUEN-LI CHEN |
Issue Date: | 1998 | Journal Volume: | 16 | Journal Issue: | 6 | Start page/Pages: | 3612 | Source: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491409 | ISSN: | 0734211X | DOI: | 10.1116/1.590314 |
Appears in Collections: | 材料科學與工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.