https://scholars.lib.ntu.edu.tw/handle/123456789/503283
Title: | Effect of substrate bias on the promotion of nanocrystalline silicon growth from He-diluted SiH 4 plasma at low temperature | Authors: | Das, D. Raha, D. Chen, W.-C. Chen, K.-H. Wu, C.-T. Chen, L.-C. |
Issue Date: | 2012 | Publisher: | Cambridge University Press | Journal Volume: | 27 | Journal Issue: | 9 | Start page/Pages: | 1303-1313 | Source: | Journal of Materials Research | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/503283 | ISSN: | 08842914 | DOI: | 10.1557/jmr.2012.4 |
Appears in Collections: | 凝態科學研究中心 |
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