Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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1997 | Wet chemical and plasma etching of Ga<inf>2</inf>O<inf>3</inf>(Gd<inf>2</inf>O<inf>3</inf>) | Ren, F.; Hong, M.; Mannaerts, J.P.; Lothian, J.R.; Cho, A.Y.; MINGHWEI HONG | Journal of the Electrochemical Society | 27 | 24 |