Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2007 | HfO2/HfAlO/HfO2 nanolaminate charge trapping layers for high-performance nonvolatile memory device applications | Maikap, S.; Tzeng, P. J.; Wang, T. Y.; Lee, H. Y.; Lin, C. H.; Wang,? C. C.; Lee, L. S.; Yang, J. R.; Tsai, M. J. | Japanese Journal of Applied |