公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2003 | Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography processes | HSUEN-LI CHEN ; Chao W.-C; Ko F.-H; Chu T.-C; Cheng H.-C. | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 4 | 4 | |
2002 | Low dielectric constant polymer materials as bottom antireflective coating layers for both KrF and ArF lithography | HSUEN-LI CHEN ; Cheng H.-C; Ko F.-H; Chu T.-C; Huang T.-Y. | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1 | 1 |