公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2002 | Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y superlattices for high transmittance APSM at 193 nm wavelength | Lai, F. D.; LON A. WANG | Microelectronic Engineering | 2 | 2 | |
2002 | Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength | Lai, F. D.; LON A. WANG | Thin Solid Films | 11 | 11 | |
2001 | Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength | Lai, F. D.; LON A. WANG | Microelectronic Engineering | 3 | 3 | |
2001 | Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1–x–y optical superlattices for attenuated phase shift mask in ArF lithography | Lai, F. D.; Wang, L. A. | Journal of | | | |
2003 | Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line | Lai, F. D.; Huang, C. Y.; Chang, C. M.; Wang, L. A.; Cheng, W. C. | Microelectronic Engineering 67-68: | | | |
2003 | Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously | Lai, F. D.; Chang, C. M.; Wang, L. A.; Yih, T. S. | Journal of | | | |