公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2021 | Critical Role of GIDL Current for Erase Operation in 3D Vertical FeFET and Compact Long-term FeFET Retention Model | Mo F; Xiang J; Mei X; Sawabe Y; Saraya T; Hiramoto T; Su C.-J; VITA PI-HO HU ; Kobayashi M. | Digest of Technical Papers - Symposium on VLSI Technology | 4 | ||
2022 | Efficient Erase Operation by GIDL Current for 3D Structure FeFETs with Gate Stack Engineering and Compact Long-Term Retention Model | Mo F; Xiang J; Mei X; Sawabe Y; Saraya T; Hiramoto T; Su C.-J; VITA PI-HO HU ; Kobayashi M. | IEEE Journal of the Electron Devices Society | 3 | 3 |