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  4. Stability and Performance Optimization of 6T SRAM Cell at Cryogenic Temperature
 
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Stability and Performance Optimization of 6T SRAM Cell at Cryogenic Temperature

Journal
7th IEEE Electron Devices Technology and Manufacturing Conference: Strengthen the Global Semiconductor Research Collaboration After the Covid-19 Pandemic, EDTM 2023
ISBN
9798350332520
Date Issued
2023-01-01
Author(s)
Fang, Shao Fu
VITA PI-HO HU  
DOI
10.1109/EDTM55494.2023.10103047
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/631447
URL
https://api.elsevier.com/content/abstract/scopus_id/85158082769
Abstract
Cryogenic on-chip memory is viable for obtaining high-performance computing (HPC) or power reduction. Cryogenic SRAM (Cryo-SRAM) with low threshold voltage (LVT) design at reduced supply voltage (VDD) gets the maximized speed-power gain thanks to the steep subthreshold slope (SS) of cryo-CMOS. However, SRAM with LVT design at 77K may suffer the stability issue. This work demonstrates the optimized threshold voltage design for 6T cryo-SRAM. Compared to the SRAM with LVT design at 77K, the optimized 6T cryo-SRAM cells improve the read and hold static noise margin by 25% and 12%, respectively. Moreover, the optimized 6T cryo-SRAM preserves the speed-power advantages compared to 300K 6T SRAM with standard threshold voltage (SVT) design. The optimized 6T cryo-SRAMs with fast speed and superior stability could be promising candidates for HPC applications.
Type
conference paper

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To permanently archive and promote researcher profiles and scholarly works, Library integrates the services of “NTU Repository” with “Academic Hub” to form NTU Scholars.

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