Thermal stability of amorphous-like WNx/W bilayered diffusion barrier for chemical vapor deposited-tungsten/p(+)-Si contact system

Journal

Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers

Journal Volume

38

Journal Issue

3A

Pages

1343-1351

Date Issued

1999

Author(s)

Chang, K. M.

Deng, I. C.

Yeh, T. H.

Lain, K. D.

DOI

URI

Type

journal article