Improvement of p-type AlGaN conductivity with an alternating Mg-doped/un-doped AlGaN layer structure
Journal
Micromachines
Journal Volume
12
Journal Issue
7
Date Issued
2021
Author(s)
Abstract
Using molecular beam epitaxy, we prepared seven p-type AlGaN samples of ~25% in Al content, including six samples with Mg-doped/un-doped AlGaN alternating-layer structures of different layer-thickness combinations, for comparing their p-type performances. Lower sheet resistance and higher effective hole mobility are obtained in a layer-structured sample, when compared with the reference sample of uniform Mg doping. The improved p-type performance in a layer-structured sample is attributed to the diffusion of holes generated in an Mg-doped layer into the neighboring un-doped layers, in which hole mobility is significantly higher because of weak ionized impurity scattering. Among the layer-structured samples, that of 6/4 nm in Mg-doped/undoped thickness results in the lowest sheet resistance (the highest effective hole mobility), which is 4.83 times lower (4.57 times higher) when compared with the sample of uniform doping. The effects of the Mg-doped/un-doped layer structure on p-type performance in AlGaN and GaN are compared. ? 2021 by the authors. Licensee MDPI, Basel, Switzerland.
Subjects
Alternating-layer structure
Hole mobility
Mg doping
P-type AlGaN
Sheet resistance
Aluminum gallium nitride
Gallium nitride
III-V semiconductors
Molecular beam epitaxy
Semiconductor alloys
Al content
AlGaN layers
Alternating layers
Different layers
Doped layers
Ionized impurity scattering
Layer structures
Mg-doping
Magnesium alloys
Type
journal article