|Title:||Sub-micron gate by optical lithography using photoresist re-flow and spin-on-glass||Authors:||W.-S. Lour
Y. J. Yang
|Issue Date:||Jan-2001||Start page/Pages:||154-157||Source:||ECS, State-of-the-art Program on Compound Semiconductors XXXV||URI:||http://scholars.lib.ntu.edu.tw/handle/123456789/294650|
|Appears in Collections:||電機工程學系|
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